ATD series maskless photolithography equipment

AdvanTools’ ATD series maskless photolithography equipment are based on 2nd generation maskless (ML2) technology. It makes use of the spatial light modulator to achieve multi-beam scanning simultaneously.

ATD series help customers to eliminate the cost and the complex process of mask fabrication. It leads to the advantage with high performance, high precision, flexible applications. With AdvanTools’ proprietary high-power LED/LD(λ=405nm)or Excimer Laser(λ=248nm)light source, ATD series have the resolution down to 0.35um with a good overlay performance of 80nm. ATD series can be widely used in 90nm-node photomask fabrication, MEMS, LED, Bio-Chip applications, and so on.

ATD1000

ATD1000

ATD2000P

ATD2000P

ATD3000M

ATD3000M

 ATD 规格

# Item            Unit Ath1000 Ath2000P Ath4000 Ath3000M
1 Light Source [N/A] LED LED/LD LED/LD KrF Laser
2 Wave Length [nm] 405±10 405±10 405±10 248
3 Supported Substrate [Inch] 2"、4"、6" or various shaped substrates, including Si、SiN、GaAs、InP、LiNbO3、SiC etc. 2"、4"、6"、8" or various shaped substrates, including Si、SiN、GaAs、InP、LiNbO3、SiC 2"、4"、6"、8"、 9"or various shaped substrates, including Si、SiN、GaAs、InP、LiNbO3、SiC 6" Mask
4 Energy Control Accuracy [N/A] ±1% ±1% ±1% ±1%
5 Min Structure [um] 0.65 0.65 0.6 0.2
6 CDU [3σ,um] 0.1 0.06 0.05 0.01
7 Overlay Accuracy [mean+3σ,um] 0.6 0.25 0.2 0.04
9 Stripe butting/stitch error [3σ,um] 0.2 0.1 0.05 0.01
10 Throughput [mm2/min] 32.7 350 400 40