2006.04 company was founded in China in Hefei

2008.11 domestic first-submicron semiconductor direct write lithography equipment delivery customers

2009.12 domestic first semiconductor lithography equipment delivered to customers using the plate

2011.01 02 special -130-65nm national commitment to the plate lithography equipment development and industrialization

2011.05 domestic first laser direct imaging equipment (LDI) delivery customers

2012.06 undertake national carrier board with 02 special -IC exposure device (Apex 280)

2013.05 laser direct imaging equipment (LDI) high-speed models Tyche80 delivery customers

2013.07 laser direct imaging equipment (LDI) solder models Tyche90 delivery customers